In many cases where microlithography is employed the patterned microstructures are in the range of tens of micrometres and it is in the range of UV masks lithography resolution. It is a high throughput parallel exposure technique but the main bottle neck of the particular method is unavoidable need of masks. The later ones are usually produced employing higher resolution lithography technologies that as a rule of thumb are time consuming and expensive. Each new pattern in UV lithography requires new set of masks. Direct laser writing or focused laser beam ablation are perfect candidates for originating of the mask with a resolution at least of few micrometres.
The aim of this practice is to propose alternative UV lithography mask origination methods employing direct laser writing and femtosecond laser ablation technologies. Student will get acquainted with the methods and will describe the technological recipes for originating of the masks. The student will evaluate the quality of the patterned mask and microstructures patterned with UV mask lithography.
Project is funded by EU Structural Funds according to the 2014–2020 Operational Programme for the European Union Funds’ Investments priority “Development of scientific competence of researchers, other researchers, students through practical scientific activities” under Measure No. 09.3.3-LMT-K-712.
After carrying out the practice, student will prepare a manual for the UV lithography mask origination employing direct laser writing and femtosecond laser ablation. The scientific results gained during the practice will be presented in national or international conference.
Period of project implementation: 2018-10-01 - 2019-04-30
Project coordinator: Kaunas University of Technology